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ION BEAM ETCH SYSTEM


Maryland, United States
Government : Federal
RFQ
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This document has expired, therefore the above link may no longer work.

NASA/GSFC has a requirement for High Uniformity ION-BEAM Etch System. The specifications and drawings are linked above or may be accessed at http://prod.nais.nasa.g ov/cgi-bin/eps/bizops.cgi?gr=C&pin= . ]
This notice is a combined synopsis/solicitation for commercial items prepared in accordance with the format in FAR Subpart 12.6, as supplemented with additional information included in this notice. This announcement constitutes the only solicitation, which is issued as a Request for Quotation (RFQ); quotes are being requested and a written solicitation will not be issued. Offerors are required to use the On-Line RFQ system to submit their quote. The On-line RFQ system is linked above or it may be accessed at http://prod.nais.nasa.g ov/cgi-bin/eps/bizops.cgi?gr=C&pin= . The information required by FAR Subpart 12.6 is included in the on-line RFQ.
The Government intends to acquire a commercial item using FAR Part 12 and the Test Program for certain commerical items set forth in FAR Part 13.5.
Questions regarding this acquisition must be submitted in writing to [email protected] no later than June 24, 2014. (Prospective quoters shall notify this office of their intent to submit a quotation. It is the quoter's responsibility to monitor this site for the release of amendments (if any). Potential quoters will be responsible for downloading their own copy of this notice, the on-line RFQ and amendments (if any).
NASA Clause 1852.215-84, Ombudsman, is applicable. The Center Ombudsman for this acquisition can be found at http://prod.nais.nasa.gov/pub/p ub_library/Omb.html .

Michelle Delaney, Contract Specialist, Phone 301-286-4782, Fax 301-286-1720, Email [email protected] - Craig F Keish, Contracting Officer, Phone 301-286-4240, Fax 301-286-1720, Email [email protected]

Michelle Delaney

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