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Excimer Laser System
EXCIMER LASER SYSTEM FOR PULSED LASER DEPOSITION
Requirements include:
The system must be new, not used or rebuilt.
High output pulse stable energies of
400mJ@193nm at 50Hz
700mJ@248nm at 50Hz
Easy change of wavelengths between 193nm and 248nm.
Includes capability to change gas fills from ArF to KrF without changing optics, includes optimized Aluminum mirror for both 248 and 193 nm operation.
System must be tested at both 248nm (700 mJ) and 193nm (400 mJ) as per the specification. System may be shipped and installed at 248 nm.
Simple Integration and compact
Small Footprint of less than 0.5mt2
Ceramic Pre-ionization for long gas lifetime, superior beam profile.
4 weeks static gas lifetime
Homogeneous beam profile
Energy stability
